Dr. Christian Hoppe

Technical Chemistry - Research Group Grundmeier

Former

Contact

E-Mail:: hoppe@tc.uni-paderborn.de
Phone:: +49 5251 60-5743
Web:: Homepage

Office Address:: 365足彩投注_365体育投注@ Str. 100
33098 Paderborn
Room:: NW2.729

Publications

Latest Publications

Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS

C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

DOI

Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant

T.S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen, Advanced Engineering Materials 23 (2021).

DOI

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Suba??, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi, ACS Applied Materials & Interfaces (2019) 3169–3180.

DOI

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).

DOI

Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms

C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).

DOI

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